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The importance of thin film coatings on Semiconductors -- Thin Film Coatings -- YMUS Ultrasonic Spraying
With the rapid development of semiconductor integrated circuit, it also faces some challenges. First, waterproof or corrosion-resistant equipment has great appeal to consumers; Second, the equipment needs to be reliable and durable, able to withstand continuous, long time use. These are important requirements for semiconductor devices and challenges for semiconductor suppliers to address.
Thin film deposition can solve these challenges. The application of thin film coatings on semiconductors can not only improve their efficiency, but also extend their service life. However, in order to obtain high-quality films, semiconductor manufacturers must ensure that the coating method (usually ultrasonic spraying) has a high purity, high conversion.
Note:New material film coating
Photoresist plays a role of pattern transfer in semiconductor process. In the photolithography process, the surface of the material to be etched is coated with photoresist. After the photolithography is exposed, the exposed part or the unexposed part is removed in the development process, so as to obtain the required graphics. On this basis, the material is etched specifically, and finally the photoresist is removed. In the actual process, the photoresist is baked before and after exposure and after development to achieve better photolithography.
Note:Photoresist coating
YMUS ultrasonic spraying technology applied to semiconductor photoresist coating has advantages of high uniformity, good microstructure encapsulation and controllable coating area compared with traditional coating processes such as spin coating and penetration coating.